High Energy Density and High Power RF

7th Workshop on High Energy Density and High Power RF

High Energy Density and High Power RF

This is the seventh in a series of international workshops on high-power and high-energy density microwave devices for accelerator, plasma physics, and defense applications. The scope of this workshop included accelerators for high energy physics, plasma heating and current drive in controlled thermonuclear fusion research, radar and directed energy/high power microwave systems, THz sources and technologies, and advanced 2D/3D computational tool development.

High Energy Density and High Power RF

6th Workshop on High Energy Density and High Power RF

High Energy Density and High Power RF

This is the sixth in a series of international workshops on high-power and high-energy density microwave devices for accelerator, plasma physics, and defense applications. Past workshops were held in Dubna, Montauk, Hayama, Pajaro Dunes, and Snowbird. The theme is research and development of techniques to increase microwave energy density and peak power in active and passive microwave devices and components ranging from L-band to W-band. The scope of this workshop has now been broadened to include radar and high power microwave (HPM) systems, space exploration, neutron sources, and even plasma heating and current drive in controlled thermonuclear fusion research.

High Power Microwaves

High Power Microwaves

Following in the footsteps of its popular predecessors, High Power Microwaves, Third Edition continues to provide a wide-angle, integrated view of the field of high power microwaves (HPMs). This third edition includes significant updates in every chapter as well as a new chapter on beamless systems that covers nonlinear transmission lines. Written by an experimentalist, a theorist, and an applied theorist, respectively, the book offers complementary perspectives on different source types. The authors address: How HPM relates historically and technically to the conventional microwave field The possible applications for HPM and the key criteria that HPM devices have to meet in order to be applied How high power sources work, including their performance capabilities and limitations The broad fundamental issues to be addressed in the future for a wide variety of source types The book is accessible to several audiences. Researchers currently in the field can widen their understanding of HPM. Present or potential users of microwaves will discover the advantages of the dramatically higher power levels that are being made available. Newcomers to the field can pursue further research. Decision makers in direct energy acquisition and related fields, such as radar, communications, and high energy physics, can see how developments in HPM will affect them.

Gyrotrons

High-Power Microwave and Millimeter Wave Technology

Gyrotrons

Drawing on the author's wide experience, this book gives a comprehensive review of the state of the art in gyrotron technology, covering the theory, design and applications. The book includes an extensive references list which provides an excellent guide to the related literature.

Dry Etching for VLSI

Dry Etching for VLSI

This book has been written as part of a series of scientific books being published by Plenum Press. The scope of the series is to review a chosen topic in each volume. To supplement this information, the abstracts to the most important references cited in the text are reprinted, thus allowing the reader to find in-depth material without having to refer to many additional publications. This volume is dedicated to the field of dry (plasma) etching, as applied in silicon semiconductor processing. Although a number of books have appeared dealing with this area of physics and chemistry, these all deal with parts of the field. This book is unique in that it gives a compact, yet complete, in-depth overview of fundamentals, systems, processes, tools, and applications of etching with gas plasmas for VLSI. Examples are given throughout the fundamental sections, in order to give the reader a better insight in the meaning and magnitude of the many parameters relevant to dry etching. Electrical engineering concepts are emphasized to explain the pros and cons of reactor concepts and excitation frequency ranges. In the description of practical applications, extensive use is made of cross-referencing between processes and materials, as well as theory and practice. It is thus intended to provide a total model for understanding dry etching. The book has been written such that no previous knowledge of the subject is required. It is intended as a review of all aspects of dry etching for silicon semiconductor processing.